Vertical Reduced Pressure CVD Apparatus
More than 10 types of semiconductor gases can be freely controlled! Customizable.
Supports various uses such as vertical type, sheet, wafer size, gas type, and footprint. This is a high-grade vertical reduced pressure CVD system focused on versatility. It can also be customized based on standard specifications to be manufactured at a lower cost. 【Features】 ■ Supports wafer sizes of 3", 6", and 8" with a small footprint ■ Reduces natural oxidation with heater lifting function ■ Achieves stable temperature control from room temperature to 900℃ *For more details, please contact us or download the PDF for more information.
- Company:ハイテクノサービス
- Price:Other